Edge effects on plasmonic nanolithography

Xiangang Luo; Teruya Ishihara

Edge effects on plasmonic nanolithography

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Edge effects were investigated on the quality of resist patterns based on finite difference time domain (FDTD) calculations. The interference of the surface plasmon leads to nanoscale spatial distribution of light intensity, which reradiate into the photoresist. The edge effects can be removed by adding a layer of refractive-index-matched materials on the exit side of the mask. It was found that, depending on the thickness of the protection layer, the width of the resist pattern can be controlled.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2004
Pages	132-133
Number of pages	2
Publication status	Published - 2004 Dec 1
Externally published	Yes
Event	2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan Duration: 2004 Oct 26 → 2004 Oct 29

Other

Other	2004 International Microprocesses and Nanotechnology Conference
Country	Japan
City	Osaka
Period	04/10/26 → 04/10/29

ASJC Scopus subject areas

Engineering(all)

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title = "Edge effects on plasmonic nanolithography",

abstract = "Edge effects were investigated on the quality of resist patterns based on finite difference time domain (FDTD) calculations. The interference of the surface plasmon leads to nanoscale spatial distribution of light intensity, which reradiate into the photoresist. The edge effects can be removed by adding a layer of refractive-index-matched materials on the exit side of the mask. It was found that, depending on the thickness of the protection layer, the width of the resist pattern can be controlled.",

author = "Xiangang Luo and Teruya Ishihara",

year = "2004",

month = dec,

day = "1",

language = "English",

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AB - Edge effects were investigated on the quality of resist patterns based on finite difference time domain (FDTD) calculations. The interference of the surface plasmon leads to nanoscale spatial distribution of light intensity, which reradiate into the photoresist. The edge effects can be removed by adding a layer of refractive-index-matched materials on the exit side of the mask. It was found that, depending on the thickness of the protection layer, the width of the resist pattern can be controlled.

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M3 - Conference contribution

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BT - Digest of Papers - Microprocesses and Nanotechnology 2004

T2 - 2004 International Microprocesses and Nanotechnology Conference

Y2 - 26 October 2004 through 29 October 2004

ER -