Edge effects on plasmonic nanolithography

Xiangang Luo, Teruya Ishihara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Edge effects were investigated on the quality of resist patterns based on finite difference time domain (FDTD) calculations. The interference of the surface plasmon leads to nanoscale spatial distribution of light intensity, which reradiate into the photoresist. The edge effects can be removed by adding a layer of refractive-index-matched materials on the exit side of the mask. It was found that, depending on the thickness of the protection layer, the width of the resist pattern can be controlled.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2004
Pages132-133
Number of pages2
Publication statusPublished - 2004 Dec 1
Externally publishedYes
Event2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
Duration: 2004 Oct 262004 Oct 29

Other

Other2004 International Microprocesses and Nanotechnology Conference
CountryJapan
CityOsaka
Period04/10/2604/10/29

ASJC Scopus subject areas

  • Engineering(all)

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