Dynamic chemical mapping near a Si/SiO2 interface at elevated temperatures using plasmon-loss images

K. Sasaki; S. Tsukimoto; M. Konno; T. Kamino; H. Saka

doi:10.1046/j.1365-2818.2001.00911.x

Dynamic chemical mapping near a Si/SiO₂ interface at elevated temperatures using plasmon-loss images

K. Sasaki, S. Tsukimoto, M. Konno, T. Kamino, H. Saka

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Plasmon-loss imaging was applied to chemical mapping during an in-situ heating experiment. The technique was applied to observation of vibration of a Si/SiO₂ interface which took place during reduction of SiO₂ at high temperature. The chemical maps of Si and SiO₂ were recorded dynamically using a conventional TV-VTR system at a time resolution of 1/30 s.

Original language	English
Pages (from-to)	12-16
Number of pages	5
Journal	Journal of Microscopy
Volume	203
Issue number	1
DOIs	https://doi.org/10.1046/j.1365-2818.2001.00911.x
Publication status	Published - 2001 Aug 6

Keywords

Electron energy loss spectroscopy
In-situ chemical mapping
Plasmon-loss
Si/SiO interface

ASJC Scopus subject areas

Pathology and Forensic Medicine
Histology

Access to Document

10.1046/j.1365-2818.2001.00911.x

Cite this

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title = "Dynamic chemical mapping near a Si/SiO2 interface at elevated temperatures using plasmon-loss images",

abstract = "Plasmon-loss imaging was applied to chemical mapping during an in-situ heating experiment. The technique was applied to observation of vibration of a Si/SiO2 interface which took place during reduction of SiO2 at high temperature. The chemical maps of Si and SiO2 were recorded dynamically using a conventional TV-VTR system at a time resolution of 1/30 s.",

keywords = "Electron energy loss spectroscopy, In-situ chemical mapping, Plasmon-loss, Si/SiO interface",

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AU - Sasaki, K.

AU - Tsukimoto, S.

AU - Konno, M.

AU - Kamino, T.

AU - Saka, H.

PY - 2001/8/6

Y1 - 2001/8/6

N2 - Plasmon-loss imaging was applied to chemical mapping during an in-situ heating experiment. The technique was applied to observation of vibration of a Si/SiO2 interface which took place during reduction of SiO2 at high temperature. The chemical maps of Si and SiO2 were recorded dynamically using a conventional TV-VTR system at a time resolution of 1/30 s.

AB - Plasmon-loss imaging was applied to chemical mapping during an in-situ heating experiment. The technique was applied to observation of vibration of a Si/SiO2 interface which took place during reduction of SiO2 at high temperature. The chemical maps of Si and SiO2 were recorded dynamically using a conventional TV-VTR system at a time resolution of 1/30 s.

KW - Electron energy loss spectroscopy

KW - In-situ chemical mapping

KW - Plasmon-loss

KW - Si/SiO interface

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