DRY-DEVELOPABLE RESIST SYSTEMS USING ELECTON BEAM-INDUCED GRAFT POLYMERIZATION.

Masao Morita, Saburo Imamura, Toshiaki Tamamura

Research output: Contribution to journalArticlepeer-review

Abstract

A new high-resolution lithographic technique is proposed for employment with a dry-developable multilayer resist system. The technique involves direct pattern fabrication through vapor-phase graft polymerization induced by an electron beam. No wet process is involved in the pattern fabrication. The use of a double layer base film, consisting of a thin silicone resin as a top layer and a thick AZ resist film as a bottom layer, enabled transfer of graft polymerized polystyrene patterns on the silicone resin to a thick resist of submicron-sized features.

Original languageEnglish
Pages (from-to)2169-2178
Number of pages10
JournalDenki Tsushin Kenkyusho Kenkyu Jitsuyoka Hokoku
Volume33
Issue number9
Publication statusPublished - 1984 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)

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