Dry Developable Multilayer Resist Using Direct Pattern Formation by Electron Beam-Induced Vapor-Phase Polymerization

Masao Morita, Saburo imamura, Toshiaki Tamamura, Osamu Kogure, Kei Murase

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds