Dry Developable Multilayer Resist Using Direct Pattern Formation by Electron Beam-Induced Vapor-Phase Polymerization

Masao Morita, Saburo imamura, Toshiaki Tamamura, Osamu Kogure, Kei Murase

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A new technique for high resolution lithography with a dry-developed multilayer resist system is demonstrated. The technique involves a direct pattern fabrication by electron beam-induced vapor-phase graft-polymerization. No wet process was included in the pattern fabrication. The use of a double-layer base film consisting of a thin silicone resin as a top layer and a thick AZ-1350J film as a bottom layer enabled the transfer of graft-polymerized polystyrene patterns on the silicone resin to thick resist with submicron-sized feature.

Original languageEnglish
Pages (from-to)653-654
Number of pages2
JournalJournal of the Electrochemical Society
Volume131
Issue number3
DOIs
Publication statusPublished - 1984 Mar

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Dry Developable Multilayer Resist Using Direct Pattern Formation by Electron Beam-Induced Vapor-Phase Polymerization'. Together they form a unique fingerprint.

Cite this