Dome-like and dense SiC-SiO2 nanocomposite films synthesized by laser chemical vapor deposition using CO2 laser

Shu Yu, Akihiko Ito, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


SiC-SiO2 nanocomposite films were prepared by laser chemical vapor deposition (LCVD) using a CO2 laser; tetraethyl orthosilicate and acetylene were used as precursors. An amorphous phase was formed at a deposition temperature below 1650K, whereas a SiC (3C) crystalline phase was co-deposited with amorphous SiO2 at a deposition temperature above 1650K. Dome-like deposits were observed when low total pressure and high temperature were applied. At higher total pressure and lower temperature, the SiC-SiO2 nanocomposite film was obtained, with SiC grains about 10nm in diameter distributed in amorphous SiO2. The highest deposition rate was 374μm h-1 at 1675K and 400Pa.

Original languageEnglish
Pages (from-to)2818-2822
Number of pages5
JournalSurface and Coatings Technology
Issue number8-9
Publication statusPublished - 2011 Jan 25


  • Laser CVD
  • Nanocomposite
  • SiC
  • SiO

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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