Domain Wall and Domain Structure of Amorphous Multilayered Films

N. Saito; Y. Shimada; T. Sakurai

doi:10.1109/TJMJ.1985.4548940

Domain Wall and Domain Structure of Amorphous Multilayered Films

N. Saito, Y. Shimada, T. Sakurai

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Studies on the effects of nonmagnetic (SiO2) intermediate layers of various thicknesses in amorphous Co-Zr-Nb films are described. Both SiO2 and amorphous Co-Zr-Nb layers were formed by ion beam sputtering, and samples were annealed in rotating and dc magnetic fields to induce a uniaxial anisotropy. Domain wall and structure observations and coercivity measurements both indicated that as the nonmagnetic layer thickness b is increased, a transition from a multilayered to a single-layer film structure occurs at between 10 and 20 Å, while for b > 1000 Å the film loses its multilayered character.

Original language	English
Pages (from-to)	754-755
Number of pages	2
Journal	IEEE Translation Journal on Magnetics in Japan
Volume	1
Issue number	6
DOIs	https://doi.org/10.1109/TJMJ.1985.4548940
Publication status	Published - 1985 Sep
Externally published	Yes

ASJC Scopus subject areas

Engineering (miscellaneous)
Engineering(all)

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10.1109/TJMJ.1985.4548940

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title = "Domain Wall and Domain Structure of Amorphous Multilayered Films",

abstract = "Studies on the effects of nonmagnetic (SiO2) intermediate layers of various thicknesses in amorphous Co-Zr-Nb films are described. Both SiO2 and amorphous Co-Zr-Nb layers were formed by ion beam sputtering, and samples were annealed in rotating and dc magnetic fields to induce a uniaxial anisotropy. Domain wall and structure observations and coercivity measurements both indicated that as the nonmagnetic layer thickness b is increased, a transition from a multilayered to a single-layer film structure occurs at between 10 and 20 {\AA}, while for b > 1000 {\AA} the film loses its multilayered character.",

author = "N. Saito and Y. Shimada and T. Sakurai",

year = "1985",

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AU - Shimada, Y.

AU - Sakurai, T.

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N2 - Studies on the effects of nonmagnetic (SiO2) intermediate layers of various thicknesses in amorphous Co-Zr-Nb films are described. Both SiO2 and amorphous Co-Zr-Nb layers were formed by ion beam sputtering, and samples were annealed in rotating and dc magnetic fields to induce a uniaxial anisotropy. Domain wall and structure observations and coercivity measurements both indicated that as the nonmagnetic layer thickness b is increased, a transition from a multilayered to a single-layer film structure occurs at between 10 and 20 Å, while for b > 1000 Å the film loses its multilayered character.

AB - Studies on the effects of nonmagnetic (SiO2) intermediate layers of various thicknesses in amorphous Co-Zr-Nb films are described. Both SiO2 and amorphous Co-Zr-Nb layers were formed by ion beam sputtering, and samples were annealed in rotating and dc magnetic fields to induce a uniaxial anisotropy. Domain wall and structure observations and coercivity measurements both indicated that as the nonmagnetic layer thickness b is increased, a transition from a multilayered to a single-layer film structure occurs at between 10 and 20 Å, while for b > 1000 Å the film loses its multilayered character.

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Domain Wall and Domain Structure of Amorphous Multilayered Films

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