Dissociation Degree of SiH4 and film Deposition Rate under Double Tubed Coaxial Line Type Microwave Plasma CVD

Isamu Kato, Katsumi Ebashi, Noriharu Suematsu

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)331-338
Number of pages8
JournalIEEJ Transactions on Fundamentals and Materials
Volume107
Issue number7
DOIs
Publication statusPublished - 1987

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this