Direct writing of highly conductive Mo lines has been achieved by laser induced photothermal CVD from Mo(CO)//6. The resistivity of deposited Mo lines was as small as 40 mu OMEGA -cm. CVD characteristics have been examined in detail under different CVD conditions. From comparison with photochemical CVD, photothermal CVD superiority for obtaining metallic and highly conductive Mo lines has been clarified.
|Title of host publication||Conference on Solid State Devices and Materials|
|Publisher||Japan Soc of Applied Physics|
|Number of pages||4|
|ISBN (Print)||4930813107, 9784930813107|
|Publication status||Published - 1985|
|Name||Conference on Solid State Devices and Materials|
ASJC Scopus subject areas