Direct phase measurement of the X-ray specular reflection using modulation under the Bragg condition

Wataru Yashiro, Keisuke Shimizu, Keiichi Hirano, Toshio Takahashi

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

A method for determining the phase of the X-ray specular reflection using the intensity modulation caused by a Bragg reflection is proposed. The method was applied to a Si(001) single crystal covered with a layer of native oxide a few nanometers thick. Measurement of intensity along the 00 rod (specular reflection) under excitation of the 113 Bragg reflection was carried out in the so-called (+,-) parallel arrangement, and intensity modulation of the specular reflection was observed. The phase of the specular reflection from the layer of native oxide was directly determined from the experimentally obtained modulation profile.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume41
Issue number5 B
Publication statusPublished - 2002 May 15
Externally publishedYes

Keywords

  • Amorphous thin films
  • Phase problem
  • Surface structure
  • Thin film structures
  • X-ray diffraction

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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