Direct nanoimprint of inorganic-organic hybrid glass

Motoki Okinaka, Kazuhito Tsukagoshi, Yoshinobu Aoyagi

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

Inorganic-organic hybrid glass nanoimprint has been demonstrated by the transformation of polysilane polymer into Si O2 -based material. The proposed technique has the advantages of low temperature and very short processing time over conventional inorganic patterning methods. Line and space structures ranging from 50 nm to 25 μm could be precisely patterned, and an aspect ratio of 4.8 was achieved for an optimized imprint condition. Only 5% shrinkage of the structure was confirmed after heat treatment at 350 °C. The patterned film shows little solubility in acetone, acid, or alkali solution. Furthermore, only a very small change is observed when it is dipped in hydrofluoric acid. It was demonstrated that the proposed process enables nanopatterning of inorganic-organic hybrid glass with good thermal and chemical durabilities.

Original languageEnglish
Pages (from-to)1402-1404
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume24
Issue number3
DOIs
Publication statusPublished - 2006 May
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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