Direct method of surface structure determination by Patterson analysis of correlated thermal diffuse scattering for Si(001)2×1

Tadashi Abukawa, C. M. Wei, K. Yoshimura, S. Kono

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A simple oscillatory intensity variation in medium-energy electron diffraction found recently [Abukawa et al., Phys. Rev. Lett. 82, 335 (1999)] was termed correlated thermal diffuse scattering (CTDS). The potential of CTDS as a direct surface structural tool has been fully explored for the Si(001)2×1 surface at 300 K in a very-grazing-incidence condition. Nearly 2π solid-angle, three-dimensional (3D) CTDS patterns were measured for an energy range of 500-2000 eV. The 3D Patterson functions obtained by Fourier inversion of the measured CTDS patterns clearly revealed the building blocks of the Si(001)2×1 surface, i.e., the bond orientations and lengths of the buckled Si dimers, within an accuracy of 1° and 0.1 Å, respectively.

Original languageEnglish
Pages (from-to)16069-16073
Number of pages5
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume62
Issue number23
DOIs
Publication statusPublished - 2000 Dec 15

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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