Direct fabrication and nitridation of a high-quality NaTaO3 crystal layer onto a tantalum substrate

Sayaka Suzuki, Katsuya Teshima, Kunio Yubuta, Shun Ito, Yosuke Moriya, Tsuyoshi Takata, Toetsu Shishido, Kazunari Domen, Shuji Oishi

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25 Citations (Scopus)

Abstract

High-quality nano-/microtextured NaTaO3 crystal layers were successfully fabricated on Ta substrates at a relatively low temperature using molten NaNO3 as the starting material. Ta substrates coated with an aqueous NaNO3 solution were heated at 500 °C in an infrared heating furnace, whereupon Ta reacted with NaNO3 (which acted as both the Na source and the flux) to afford a layer of densely packed cubic NaTaO3 crystals that adhered readily onto the substrate. Nitridation of the NaTaO3 crystal layer by heating at 850 °C under an NH 3 flow yielded a Ta3N5 crystal layer. The crystals retained their original size and shape but became highly porous after nitridation. TEM observations clearly indicated that the porous cubic crystals consisted of highly crystalline nanoparticles.

Original languageEnglish
Pages (from-to)7178-7183
Number of pages6
JournalCrystEngComm
Volume14
Issue number21
DOIs
Publication statusPublished - 2012 Nov 7

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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    Suzuki, S., Teshima, K., Yubuta, K., Ito, S., Moriya, Y., Takata, T., Shishido, T., Domen, K., & Oishi, S. (2012). Direct fabrication and nitridation of a high-quality NaTaO3 crystal layer onto a tantalum substrate. CrystEngComm, 14(21), 7178-7183. https://doi.org/10.1039/c2ce25901j