Direct domain wall thickness measurement using scanning nonlinear dielectric microscopy

Y. Cho, K. Matsuura, N. Valanoor, R. Ramesh

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Using Scanning Nonlinear Dielectric Microscopy (SNDM) which has attained sub-nanometer resolution, we measured the linear dielectric constant of a-domains and c-domains in the (1,0,0) and (0,0,1) oriented PbZr 0.2 Ti 0.8 O 3 thin film and confirmed that the dielectric constant of a-domain is higher than that of c-domain. Next, we observed 90 domain walls (a-c domain walls) and 180 domain walls (c-c domain walls) and we obtained the minimum value of 180 c-c domain wall thickness was 1.87 nm and 90 a-c domain wall was 2.52 nm.

Original languageEnglish
Pages (from-to)171-180
Number of pages10
JournalFerroelectrics
Volume292
DOIs
Publication statusPublished - 2003 Jun 1

Keywords

  • 180° c-c domain wall
  • 90° a-c domain wall
  • Linear dielectric constant
  • Nonlinear dielectric constant
  • PZT thin film
  • Scanning nonlinear dielectric microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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