TY - JOUR
T1 - Digital electron microscopy on advanced materials
AU - Shindo, D.
AU - Ikematsu, Y.
AU - Lim, S. H.
AU - Yonenaga, I.
N1 - Funding Information:
The authors thank Professor C. J. Humphreys and Dr. P. D. Brown, University of Cambridge, for their useful discussion, and they also thank Dr. Y. Murakami, Tohoku University, for his cooperation in a part of the work. This study was partly supported by a Grant-in-Aid for Scientific Research on the Priority Area “Investigation of Microscopic Mechanisms of Phase Transformations for the Structure Control of Materials” from the Ministry of Education, Science, Sports and Culture of Japan.
PY - 2000
Y1 - 2000
N2 - Digital electron microscopy has been developed and applied to the structure analysis of advanced materials such as semiconductors and alloys. First of all, quantitative high-resolution electron microscopy was carried out on a Z-type faulted dipole in GaAs with the through-focus method. Through the quantitative analysis of the high-resolution images, the atomic displacement around the stacking fault was accurately evaluated. In the analysis of electron diffraction patterns of a Cu0.725Pd0.275 alloy, an energy filter was utilized to obtain electron diffraction patterns with a small background removing the inelastically scattered electrons. From the analysis of diffuse scattering of the Cu0.725Pd0.275 alloy, the short-range order parameters were quantitatively evaluated. Finally, it is pointed out that, based on the digital data of electron microscope images, the construction of the data base such as `EMILIA' (Electron Microscope Image Library and Archive: http://asma7.iamp.tohoku.ac.jp/EMILIA) is quite important for the future research of advanced materials characterization.
AB - Digital electron microscopy has been developed and applied to the structure analysis of advanced materials such as semiconductors and alloys. First of all, quantitative high-resolution electron microscopy was carried out on a Z-type faulted dipole in GaAs with the through-focus method. Through the quantitative analysis of the high-resolution images, the atomic displacement around the stacking fault was accurately evaluated. In the analysis of electron diffraction patterns of a Cu0.725Pd0.275 alloy, an energy filter was utilized to obtain electron diffraction patterns with a small background removing the inelastically scattered electrons. From the analysis of diffuse scattering of the Cu0.725Pd0.275 alloy, the short-range order parameters were quantitatively evaluated. Finally, it is pointed out that, based on the digital data of electron microscope images, the construction of the data base such as `EMILIA' (Electron Microscope Image Library and Archive: http://asma7.iamp.tohoku.ac.jp/EMILIA) is quite important for the future research of advanced materials characterization.
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U2 - 10.1016/S1044-5803(00)00073-5
DO - 10.1016/S1044-5803(00)00073-5
M3 - Conference article
AN - SCOPUS:0034171471
VL - 44
SP - 375
EP - 384
JO - Materials Characterization
JF - Materials Characterization
SN - 1044-5803
IS - 4
T2 - 5th IUMRS International Conference on Advance Materials
Y2 - 13 June 1999 through 18 June 1999
ER -