Diffusionally accommodated interfacial sliding in metal-silicon systems

K. A. Peterson, I. Dutta, M. W. Chen

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    27 Citations (Scopus)


    The kinetics and mechanism of diffusionally accommodated interfacial sliding (interfacial creep) under far-field shear and normal stresses was studied, based on diffusion-bonded Al-Si-Al sandwich specimens. A previously developed interfacial creep law [Funn and Dutta, Acta Mater 1999; 47: 149], which proposed that interfaces may slide via interface-diffusion controlled diffusional creep, was experimentally validated by carrying out a systematic parametric study. In agreement with the model, the Si-Al interfaces slid via diffusional creep (n = 1) under the influence of an effective shear stress, which depends on the far-field shear and normal stresses, as well as the interfacial topography. Compressive stresses acting normal to the interface lowered the effective shear stress, resulting in a threshold effect, thus reducing the sliding rate. The rate of sliding was controlled by diffusional mass transport through a thin amorphous, O-rich interfacial layer, under the influence of local interfacial stress gradients, which arose due to the topological features of the interface. Instances of interfacial sliding in the absence of interfacial de-cohesion, which have been noted in composites, thin-film systems, etc., may be explained by the present mechanism, which also offers an alternative rationalization of threshold behavior during diffusional flow (besides interface-reaction control).

    Original languageEnglish
    Pages (from-to)2831-2846
    Number of pages16
    JournalActa Materialia
    Issue number10
    Publication statusPublished - 2003 Jun 11


    • Diffusional creep
    • Interfacial sliding
    • Interfacial topography
    • Threshold stress

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Ceramics and Composites
    • Polymers and Plastics
    • Metals and Alloys


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