Diffusion process of interstitial atoms in InP studied by transmission electron microscopy

Y. Ohno, S. Takeda, M. Hirata

Research output: Contribution to journalConference articlepeer-review


It is found that interstitial agglomerates are formed uniformly in an irradiated area of InP by annealing at the temperature above 700 K after 200 keV-electron irradiation. TEM observation shows that the number density of interstitial atoms in the agglomerates reached a maximum value when the growth of all the agglomerates stopped. The final density did not depend on annealing temperature but on electron dose, and it increased quadratically with electron dose up to 2×1022 cm-2. In order to explain the experimental results, we have proposed a new model that the agglomerates are formed by thermal diffusion and agglomeration of interstitial-pairs, i.e. In-Pi interstitial-pairs. From the analysis, the migration energies for the pairs are estimated to be 1.52 eV. The onset temperature for the diffusion of the pairs is estimated as 550 K.

Original languageEnglish
Pages (from-to)435-440
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 1997
Externally publishedYes
EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
Duration: 1996 Dec 21996 Dec 6

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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