Diffusion plasma chemical vapour deposition yielding freestanding individual single-walled carbon nanotubes on a silicon-based flat substrate

Toshiaki Kato, Rikizo Hatakeyama, Kazuyuki Tohji

Research output: Contribution to journalArticlepeer-review

37 Citations (Scopus)

Abstract

Isolated freestanding single-walled carbon nanotubes (SWNTs) have been successfully produced on silicon-based flat substrates using diffusion plasma-enhanced chemical vapour deposition. The quantitative effects of plasma parameters, such as ion density and sheath electric field, on the growth and tube alignments of freestanding SWNTs are discussed on the basis of Langmuir probe measurements and simple calculations.

Original languageEnglish
Pages (from-to)2223-2226
Number of pages4
JournalNanotechnology
Volume17
Issue number9
DOIs
Publication statusPublished - 2006 May 14

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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