Different spin relaxation mechanisms between epitaxial and polycrystalline Ta thin films

Hiromu Gamou, Jeongchun Ryu, Makoto Kohda, Junsaku Nitta

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We demonstrate that spin relaxation mechanisms are different between epitaxial Ta and disordered polycrystalline Ta thin films by determining the relationship between spin relaxation time and diffusion constant. To control the diffusion constant, epitaxial Ta and polycrystalline Ta thin films are prepared by sputtering on different substrates and at different growth temperatures. The spin relaxation time is extracted from the results of weak antilocalization analysis including the superconducting fluctuation effect. The dominant spin relaxation mechanism for polycrystalline Ta thin films is the Elliot-Yafet mechanism, as is expected for centrosymmetric metal films. In contrast, the D'yakonov-Perel' mechanism plays a role in epitaxial Ta thin films.

Original languageEnglish
Article number023003
JournalApplied Physics Express
Volume10
Issue number2
DOIs
Publication statusPublished - 2017 Feb

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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