Dielectric constant of ultrathin SiO2 film estimated from the Auger parameter

K. Hirose, H. Kitahara, T. Hattori

    Research output: Contribution to journalArticle

    37 Citations (Scopus)

    Abstract

    The dielectric constant ε of ultrathin (0.55-7.96 nm) SiO2 films formed on a Si(001) substrate was characterized in terms of the modified Auger parameter of Si atoms, α′Si. The α′Si was found to be as much as 0.7 eV higher for an ultrathin (0.68 nm) SiO2 film than for thick SiO2 films. From the observed oxide thickness dependence of α′Si, the ε of ultrathin SiO2 films was estimated by calculating the change in the polarization energy and the change in the electrostatic screening energy originating from dielectric discontinuity at the SiO2/Si interface. The ε of ultrathin (0.68-2.13 nm) SiO2 films was identical to that of bulk SiO2 within ±1%.

    Original languageEnglish
    Article number195313
    Pages (from-to)1953131-1953135
    Number of pages5
    JournalPhysical Review B - Condensed Matter and Materials Physics
    Volume67
    Issue number19
    Publication statusPublished - 2003 May

    ASJC Scopus subject areas

    • Condensed Matter Physics

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