Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filament

H. Matsubara, T. Sakuma

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)

Abstract

Diamond deposition on WC-Co cemented carbide was examined by chemical vapour deposition using a tantalum filament. The filament was much superior to conventional tungsten filament for high-temperature use. Diamond film was deposited at a filament temperature up to about 2600 °C for tantalum filament, which was much higher than the maximum filament temperature available for tungsten (2000 °C). The critical methane concentration in H2-CH4 gas for diamond deposition became higher with increasing filament temperature. A deposition rate about 20 times higher was obtained when using a tantalum filament compared with a tungsten filament. The origin of the improved deposition rate of diamond on WC-Co substrate using a tantalum filament is discussed.

Original languageEnglish
Pages (from-to)4472-4476
Number of pages5
JournalJournal of Materials Science
Volume25
Issue number10
DOIs
Publication statusPublished - 1990 Oct 1
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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