Development of UV-curable resins suitable for reverse-Tone lithography for au metamaterials using a print-And-imprint method

Takuya Uehara, Shinya Sato, Shunya Ito, Haruna Yano, Takahiro Nakamura, Masaru Nakagawa

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reversetone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pas for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-Tone lithography in a printand- imprint method to fabricate 20-nm-Thick and 50-nm-linewide Au split-ring resonator arrays.

Original languageEnglish
Pages (from-to)178-186
Number of pages9
JournalBulletin of the Chemical Society of Japan
Volume91
Issue number2
DOIs
Publication statusPublished - 2018 Jan 1

ASJC Scopus subject areas

  • Chemistry(all)

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