Development of partly polished polycrystalline diamond films on steel substrates for slider applications

Atsushi Tsutsui; Hiroyuki Miki; Takanori Takeno; Toshiyuki Takagi

doi:10.3233/JAE-2010-1294

Development of partly polished polycrystalline diamond films on steel substrates for slider applications

Atsushi Tsutsui, Hiroyuki Miki, Takanori Takeno, Toshiyuki Takagi

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

CVD diamond films are expected to become maintenance-free solid lubricant coatings. However, substrates on which diamond film can be deposited have been limited to materials such as silicon and tungsten carbides. If diamond films can be deposited onto steel substrates, it will increase the number of possible applications. Diamond film was deposited on a steel substrate with an interlayer and was partly polished. Tungsten and titanium were selected as materials for the interlayer between diamond film and AISI 440C steel substrate. Low and stable friction coefficients were obtained between diamond film and AISI D2 pin, with friction coefficient 0.1 in the steady-state regime.

Original language	English
Pages (from-to)	1629-1634
Number of pages	6
Journal	International Journal of Applied Electromagnetics and Mechanics
Volume	33
Issue number	3-4
DOIs	https://doi.org/10.3233/JAE-2010-1294
Publication status	Published - 2010

Keywords

Diamond film
Friction
Interlayer
Stainless steel

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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abstract = "CVD diamond films are expected to become maintenance-free solid lubricant coatings. However, substrates on which diamond film can be deposited have been limited to materials such as silicon and tungsten carbides. If diamond films can be deposited onto steel substrates, it will increase the number of possible applications. Diamond film was deposited on a steel substrate with an interlayer and was partly polished. Tungsten and titanium were selected as materials for the interlayer between diamond film and AISI 440C steel substrate. Low and stable friction coefficients were obtained between diamond film and AISI D2 pin, with friction coefficient 0.1 in the steady-state regime.",

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AU - Tsutsui, Atsushi

AU - Miki, Hiroyuki

AU - Takeno, Takanori

AU - Takagi, Toshiyuki

PY - 2010

Y1 - 2010

N2 - CVD diamond films are expected to become maintenance-free solid lubricant coatings. However, substrates on which diamond film can be deposited have been limited to materials such as silicon and tungsten carbides. If diamond films can be deposited onto steel substrates, it will increase the number of possible applications. Diamond film was deposited on a steel substrate with an interlayer and was partly polished. Tungsten and titanium were selected as materials for the interlayer between diamond film and AISI 440C steel substrate. Low and stable friction coefficients were obtained between diamond film and AISI D2 pin, with friction coefficient 0.1 in the steady-state regime.

AB - CVD diamond films are expected to become maintenance-free solid lubricant coatings. However, substrates on which diamond film can be deposited have been limited to materials such as silicon and tungsten carbides. If diamond films can be deposited onto steel substrates, it will increase the number of possible applications. Diamond film was deposited on a steel substrate with an interlayer and was partly polished. Tungsten and titanium were selected as materials for the interlayer between diamond film and AISI 440C steel substrate. Low and stable friction coefficients were obtained between diamond film and AISI D2 pin, with friction coefficient 0.1 in the steady-state regime.

KW - Diamond film

KW - Friction

KW - Interlayer

KW - Stainless steel

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