Development of microwave-excited plasma-enhanced metal-organic chemical vapor deposition system for forming ferroelectric Sr2(Ta 1-x,Nbx)2O7 thin film on amorphous SiO2

Ichirou Takahashi, Kiyoshi Funaiwa, Keita Azumi, Satoru Yamashita, Yasuyuki Shirai, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi

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2 Citations (Scopus)

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