Development of highly-functional ceramic materials by chemical vapor deposition

Takashi Goto

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


Chemical vapor deposition (CVD) has been commonly employed as a thin film processing, whereas thick films and bulk ceramic materials can be also obtained by modifying and optimizing CVD conditions and apparatus. The development of highly-functional bulk ceramic materials and thick films by CVD has been reviewed in this paper. Monolithic Ti3SiC2 bulk material was synthesized by CVD, and was identified as a machinable soft ceramic material. SiC and Si3N4 are hardly sinterable materials, thus sintering aids are inevitable to consolidate these powders. However, such aids would yield significant deterioration of their high-temperature performance. Thermal CVD can provide bulk bodies by enhancing deposition rates. CVD SiC bulk body was used to investigate intrinsic nature of SiC, particularly high-temperature oxidation mechanism. By introducing laser in CVD, the deposition rate was tremendously increased several 100 to 1000 times greater than that of conventional CVD. Laser CVD enabled one to realize thermal barrier coating of yttria stabilized zirconia (YSZ). This YSZ coating contained a large amount of nanopores being beneficial for thermal insulation. Plasma enhanced CVD produced characteristic Ru-C film, where Ru nano-particles dispersed in an amorphous C matrix. This film can be a promising catalytic electrode for oxygen sensors and fuel cells.

Original languageEnglish
Pages (from-to)863-872
Number of pages10
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Issue number12
Publication statusPublished - 2007 Dec


  • Functional ceramics
  • High deposition rate
  • Laser CVD
  • Plasma CVD
  • Thermal CVD

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry


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