Abstract
Vapor/liquid hybrid deposition (VALID) is a modified atomic layer deposition (ALD) method that combines adsorption of metal precursors from the vapor phase with their hydrolysis from the liquid phase. This paper is a report of the development of an automated VALID apparatus that performs the adsorption/hydrolysis processes with a reasonable throughput. HfO2 films have been successfully produced with this automated system using Hf(O′C4H9)4 [hafnium tetra-fert-butoxide (HTB)]as the precursor. A brief discussion is given on the contribution of multilayer adsorption of HTB to the observed deposition rates.
Original language | English |
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Pages (from-to) | 214-219 |
Number of pages | 6 |
Journal | Chemical Vapor Deposition |
Volume | 12 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2006 Apr 1 |
Keywords
- Adsorption
- Atomic layer deposition
- High-k dielectrics
- Hydrolysis
- Vapor/liquid hybrids
ASJC Scopus subject areas
- Electrochemistry
- Process Chemistry and Technology
- Surfaces, Coatings and Films
- Surfaces and Interfaces
- Condensed Matter Physics
- Electronic, Optical and Magnetic Materials