Development of a xenon recycling and supply system for plasma process

M. Yamawaki, T. Urakami, Y. Ishihara, Y. Shirai, A. Teramoto, T. Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Xenon (Xe) has been used in damage-free plasma processes for realizing future semiconductor device manufacturing, even though being very rare and expensive. Therefore, we developed a system that can recycle with a high recovery ratio and supply low-cost Xe. This system can separate Xe from gas mixtures, including Nitrogen (N2), Argon (Ar), Oxygen (O 2), Hydrogen (H2), and Helium (He), with a 99.999 % recovery ratio. Usage of this system lowered Xe costs to less than 1/100th the cost of a Xe cylinder.

Original languageEnglish
Title of host publication2007 International Symposium on Semiconductor Manufacturing, ISSM - Conference Proceedings
Pages175-178
Number of pages4
DOIs
Publication statusPublished - 2007 Dec 1
Event16th Annual 2007 International Symposium on Semiconductor Manufacturing, ISSM - Santa Clara, CA, United States
Duration: 2007 Oct 152007 Oct 17

Publication series

NameIEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
ISSN (Print)1523-553X

Other

Other16th Annual 2007 International Symposium on Semiconductor Manufacturing, ISSM
Country/TerritoryUnited States
CitySanta Clara, CA
Period07/10/1507/10/17

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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