TY - JOUR
T1 - Development of a versatile micro-focused angle-resolved photoemission spectroscopy system with Kirkpatrick-Baez mirror optics
AU - Kitamura, Miho
AU - Souma, Seigo
AU - Honma, Asuka
AU - Wakabayashi, Daisuke
AU - Tanaka, Hirokazu
AU - Toyoshima, Akio
AU - Amemiya, Kenta
AU - Kawakami, Tappei
AU - Sugawara, Katsuaki
AU - Nakayama, Kosuke
AU - Yoshimatsu, Kohei
AU - Kumigashira, Hiroshi
AU - Sato, Takafumi
AU - Horiba, Koji
N1 - Funding Information:
This work was supported by JST-CREST (Grant No. JPMJCR18T1), JST-PRESTO (Grant No. JPMJPR20A8), JSPS (JSPS KAKENHI, Grant Nos. JP17H01139, JP18K14130, JP26287071, JP20K20906, JP20H02853, JP20H01847, JP21H04435, JP21H01757, and JP21K14541), the MEXT Element Strategy Initiative to Form Core Research Center (Grant No. JPMXP0112101001), and KEK-PF (Proposal Nos. 2018S2-001 and 2021S2-001). T. Kawakami acknowledges GP-Spin for financial support. This work was supported by the Mechanical Engineering Center, Applied Research Laboratory, KEK.
Publisher Copyright:
© 2022 Author(s).
PY - 2022/3/1
Y1 - 2022/3/1
N2 - Angle-resolved photoemission spectroscopy using a micro-focused beam spot [micro-angle-resolved photoemission spectroscopy (ARPES)] is becoming a powerful tool to elucidate key electronic states of exotic quantum materials. We have developed a versatile micro-ARPES system based on the synchrotron radiation beam focused with a Kirkpatrick-Baez mirror optics. The mirrors are monolithically installed on a stage, which is driven with five-axis motion, and are vibrationally separated from the ARPES measurement system. Spatial mapping of the Au photolithography pattern on Si signifies the beam spot size of 10 μm (horizontal) × 12 μm (vertical) at the sample position, which is well suited to resolve the fine structure in local electronic states. Utilization of the micro-beam and the high precision sample motion system enables the accurate spatially resolved band-structure mapping, as demonstrated by the observation of a small band anomaly associated with tiny sample bending near the edge of a cleaved topological insulator single crystal.
AB - Angle-resolved photoemission spectroscopy using a micro-focused beam spot [micro-angle-resolved photoemission spectroscopy (ARPES)] is becoming a powerful tool to elucidate key electronic states of exotic quantum materials. We have developed a versatile micro-ARPES system based on the synchrotron radiation beam focused with a Kirkpatrick-Baez mirror optics. The mirrors are monolithically installed on a stage, which is driven with five-axis motion, and are vibrationally separated from the ARPES measurement system. Spatial mapping of the Au photolithography pattern on Si signifies the beam spot size of 10 μm (horizontal) × 12 μm (vertical) at the sample position, which is well suited to resolve the fine structure in local electronic states. Utilization of the micro-beam and the high precision sample motion system enables the accurate spatially resolved band-structure mapping, as demonstrated by the observation of a small band anomaly associated with tiny sample bending near the edge of a cleaved topological insulator single crystal.
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U2 - 10.1063/5.0074393
DO - 10.1063/5.0074393
M3 - Article
C2 - 35364976
AN - SCOPUS:85127387839
SN - 0034-6748
VL - 93
JO - Review of Scientific Instruments
JF - Review of Scientific Instruments
IS - 3
M1 - 033906
ER -