Development of a simple probe for non-destructive reversible electric contact to nm-thick films and 2D films

Michiko Yoshitake; Shinjiro Yagyu; Toyohiro Chikyow

doi:10.1380/ejssnt.2015.307

Development of a simple probe for non-destructive reversible electric contact to nm-thick films and 2D films

Michiko Yoshitake, Shinjiro Yagyu, Toyohiro Chikyow

Advanced Institute for Materials Research (AIMR)

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A simple probe that is applicable as an electric contact to nm-thick films and 2D films such as graphene and MoS₂ without destroying the specimen has been developed. The concept of the development of the probe is based on the repulsive region used in atomic force microscopy technique but without any precise feedback. The robust electric contact with the probe has been demonstrated by biased XPS measurement of a MOS specimen and by resistivity measurement of a 5-layer graphene film on sapphire. It has also proved that there was no detectable damage or contaminations on the specimens after the measurements.

Original language	English
Pages (from-to)	307-311
Number of pages	5
Journal	e-Journal of Surface Science and Nanotechnology
Volume	13
DOIs	https://doi.org/10.1380/ejssnt.2015.307
Publication status	Published - 2015 Jun 20

Keywords

Electrical transport
MOS structures
Photoelectron spectroscopy
Polycrystalline thin films
Schottky barrier

ASJC Scopus subject areas

Biotechnology
Bioengineering
Condensed Matter Physics
Mechanics of Materials
Surfaces and Interfaces
Surfaces, Coatings and Films

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abstract = "A simple probe that is applicable as an electric contact to nm-thick films and 2D films such as graphene and MoS2 without destroying the specimen has been developed. The concept of the development of the probe is based on the repulsive region used in atomic force microscopy technique but without any precise feedback. The robust electric contact with the probe has been demonstrated by biased XPS measurement of a MOS specimen and by resistivity measurement of a 5-layer graphene film on sapphire. It has also proved that there was no detectable damage or contaminations on the specimens after the measurements.",

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AU - Chikyow, Toyohiro

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Y1 - 2015/6/20

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AB - A simple probe that is applicable as an electric contact to nm-thick films and 2D films such as graphene and MoS2 without destroying the specimen has been developed. The concept of the development of the probe is based on the repulsive region used in atomic force microscopy technique but without any precise feedback. The robust electric contact with the probe has been demonstrated by biased XPS measurement of a MOS specimen and by resistivity measurement of a 5-layer graphene film on sapphire. It has also proved that there was no detectable damage or contaminations on the specimens after the measurements.

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KW - Photoelectron spectroscopy

KW - Polycrystalline thin films

KW - Schottky barrier

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Development of a simple probe for non-destructive reversible electric contact to nm-thick films and 2D films

Abstract

Keywords

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