Development of a Minimal multi-target helicon sputtering tool

Kazunori Takahashi, Taichi Saito, Hiroyuki Kawasaki, Hayato Chiba, Naoyo Yamamoto, Hisashi Mizuguchi, Michihiro Inoue, Shiro Hara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A Minimal multi-target helicon sputtering tool is developed to deposit a multi-layer metallic film for electrodes and interconnection wires in the Minimal Fab System.

Original languageEnglish
Title of host publication2018 International Symposium on Semiconductor Manufacturing, ISSM 2018 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538662687
DOIs
Publication statusPublished - 2019 Feb 22
Event2018 International Symposium on Semiconductor Manufacturing, ISSM 2018 - Tokyo, Japan
Duration: 2018 Dec 102018 Dec 11

Publication series

NameIEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
Volume2018-December
ISSN (Print)1523-553X

Conference

Conference2018 International Symposium on Semiconductor Manufacturing, ISSM 2018
CountryJapan
CityTokyo
Period18/12/1018/12/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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  • Cite this

    Takahashi, K., Saito, T., Kawasaki, H., Chiba, H., Yamamoto, N., Mizuguchi, H., Inoue, M., & Hara, S. (2019). Development of a Minimal multi-target helicon sputtering tool. In 2018 International Symposium on Semiconductor Manufacturing, ISSM 2018 - Proceedings [8651177] (IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings; Vol. 2018-December). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ISSM.2018.8651177