@inproceedings{45fa69b44024411ab276a335a3e4af36,
title = "Development of a MEMS electrostatic condenser lens array for nc-Si surface electron emitters of the Massive Parallel Electron Beam Direct-Write system",
abstract = "Developments of a Micro Electro-Mechanical System (MEMS) electrostatic Condenser Lens Array (CLA) for a Massively Parallel Electron Beam Direct Write (MPEBDW) lithography system are described. The CLA converges parallel electron beams for fine patterning. The structure of the CLA was designed on a basis of analysis by a finite element method (FEM) simulation. The lens was fabricated with precise machining and assembled with a nanocrystalline silicon (nc-Si) electron emitter array as an electron source of MPEBDW. The nc-Si electron emitter has the advantage that a vertical-emitted surface electron beam can be obtained without any extractor electrodes. FEM simulation of electron optics characteristics showed that the size of the electron beam emitted from the electron emitter was reduced to 15% by a radial direction, and the divergence angle is reduced to 1/18.",
keywords = "Condenser Lens Array, Electron Beam Lithography, MEMS, Massive Parallel, Nanocrystalline Silicon",
author = "A. Kojima and N. Ikegami and T. Yoshida and H. Miyaguchi and M. Muroyama and S. Yoshida and K. Totsu and N. Koshida and M. Esashi",
year = "2016",
month = jan,
day = "1",
doi = "10.1117/12.2219338",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Cheng, {Joy Y.} and Christopher Bencher",
booktitle = "Alternative Lithographic Technologies VIII",
note = "Alternative Lithographic Technologies VIII ; Conference date: 22-02-2016 Through 25-02-2016",
}