Development of a 17×17 parallel electron beam lithography system

Hiroshi Miyaguchi, Masanori Muroyama, Shinya Yoshida, Naokatsu Ikegami, Akira Kojima, Shuji Tanaka, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

The 17× 17 parallel electron beam lithography system has been implemented and evaluated to clarify its system problems and to accelerate a 100× 100 massive parallel electron beam direct draw system under development. This paper describes its system concept, an electron emitter driver circuit, its control system and an exposure result.

Original languageEnglish
Pages (from-to)413-419
Number of pages7
JournalIEEJ Transactions on Sensors and Micromachines
Volume136
Issue number9
DOIs
Publication statusPublished - 2016 Jan 1

Keywords

  • Aberration correction
  • Nc-si
  • Parallel electron beam lithography
  • Reduction projection

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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