The 17× 17 parallel electron beam lithography system has been implemented and evaluated to clarify its system problems and to accelerate a 100× 100 massive parallel electron beam direct draw system under development. This paper describes its system concept, an electron emitter driver circuit, its control system and an exposure result.
- Aberration correction
- Parallel electron beam lithography
- Reduction projection
ASJC Scopus subject areas
- Mechanical Engineering
- Electrical and Electronic Engineering