TY - JOUR
T1 - Deuterium retention in Ti1-xBx films deposited onto molybdenum by co-sputtering method
AU - Shikama, T.
AU - Noda, T.
AU - Fukutomi, M.
AU - Okada, M.
N1 - Copyright:
Copyright 2014 Elsevier B.V., All rights reserved.
PY - 1986
Y1 - 1986
N2 - Deuterium retention behavior was studied on Ti1-xBx films deposited onto molybdenum substrates by co-sputtering method. The coatings were irradiated by 6 keV D3+ to doses of 0.1-0.7 Coulomb at room temperature and then were heated up to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior was found to depend strongly on chemical composition of the films. The degree of crystallization also affected the retention behavior.
AB - Deuterium retention behavior was studied on Ti1-xBx films deposited onto molybdenum substrates by co-sputtering method. The coatings were irradiated by 6 keV D3+ to doses of 0.1-0.7 Coulomb at room temperature and then were heated up to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior was found to depend strongly on chemical composition of the films. The degree of crystallization also affected the retention behavior.
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U2 - 10.1016/S0022-3115(86)80027-7
DO - 10.1016/S0022-3115(86)80027-7
M3 - Article
AN - SCOPUS:0022920392
VL - 141-143
SP - 156
EP - 159
JO - Journal of Nuclear Materials
JF - Journal of Nuclear Materials
SN - 0022-3115
IS - PART 1
ER -