Deuterium retention in Ti1-xBx films deposited onto molybdenum by co-sputtering method

T. Shikama; T. Noda; M. Fukutomi; M. Okada

doi:10.1016/S0022-3115(86)80027-7

Deuterium retention in Ti_1-xB_x films deposited onto molybdenum by co-sputtering method

T. Shikama, T. Noda, M. Fukutomi, M. Okada

Institute for Materials Research (IMR)

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Deuterium retention behavior was studied on Ti_1-xB_x films deposited onto molybdenum substrates by co-sputtering method. The coatings were irradiated by 6 keV D₃⁺ to doses of 0.1-0.7 Coulomb at room temperature and then were heated up to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior was found to depend strongly on chemical composition of the films. The degree of crystallization also affected the retention behavior.

Original language	English
Pages (from-to)	156-159
Number of pages	4
Journal	Journal of Nuclear Materials
Volume	141-143
Issue number	PART 1
DOIs	https://doi.org/10.1016/S0022-3115(86)80027-7
Publication status	Published - 1986

ASJC Scopus subject areas

Nuclear and High Energy Physics
Materials Science(all)
Nuclear Energy and Engineering

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title = "Deuterium retention in Ti1-xBx films deposited onto molybdenum by co-sputtering method",

abstract = "Deuterium retention behavior was studied on Ti1-xBx films deposited onto molybdenum substrates by co-sputtering method. The coatings were irradiated by 6 keV D3+ to doses of 0.1-0.7 Coulomb at room temperature and then were heated up to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior was found to depend strongly on chemical composition of the films. The degree of crystallization also affected the retention behavior.",

author = "T. Shikama and T. Noda and M. Fukutomi and M. Okada",

year = "1986",

doi = "10.1016/S0022-3115(86)80027-7",

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pages = "156--159",

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issn = "0022-3115",

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T1 - Deuterium retention in Ti1-xBx films deposited onto molybdenum by co-sputtering method

AU - Shikama, T.

AU - Noda, T.

AU - Fukutomi, M.

AU - Okada, M.

PY - 1986

Y1 - 1986

N2 - Deuterium retention behavior was studied on Ti1-xBx films deposited onto molybdenum substrates by co-sputtering method. The coatings were irradiated by 6 keV D3+ to doses of 0.1-0.7 Coulomb at room temperature and then were heated up to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior was found to depend strongly on chemical composition of the films. The degree of crystallization also affected the retention behavior.

AB - Deuterium retention behavior was studied on Ti1-xBx films deposited onto molybdenum substrates by co-sputtering method. The coatings were irradiated by 6 keV D3+ to doses of 0.1-0.7 Coulomb at room temperature and then were heated up to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior was found to depend strongly on chemical composition of the films. The degree of crystallization also affected the retention behavior.

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JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

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