Determination of the thickness and distribution of a Langmuir-Blodgett film using soft X-ray reflection

A. Momose, Y. Hirai, I. Waki, S. Imazeki, Y. Tomioka, K. Hayakawa, M. Naito

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

This paper reports the simultaneous observation of the thickness and distribution of XY-type Langmuir-Blodgett (LB) films by measurement of the reflectivity of soft X-rays using synchrotron radiation. The thickness and distribution are obtained by analysing the oscillation of the reflectivity, which is produced by varying the wavelength λ or grazing angle θ. The thickness obtained is compared with models of the XY-type deposition mechanism. It is shown that the molecular overturning model is the most satisfactory.

Original languageEnglish
Pages (from-to)519-523
Number of pages5
JournalThin Solid Films
Volume178
Issue number1-2
DOIs
Publication statusPublished - 1989 Nov 1
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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