Determination of electron escape depth in ultrathin silicon oxide

H. Nohira, H. Okamoto, K. Azuma, Y. Nakata, E. Ikenaga, K. Kobayashi, Y. Takata, S. Shin, T. Hattori

    Research output: Contribution to journalArticlepeer-review

    11 Citations (Scopus)

    Fingerprint

    Dive into the research topics of 'Determination of electron escape depth in ultrathin silicon oxide'. Together they form a unique fingerprint.

    Physics & Astronomy