TY - JOUR
T1 - Detection of molecular oxygen adsorbate during room-temperature oxidation of Si(100)2 ' 1 surface
T2 - In situ synchrotron radiation photoemission study
AU - Yoshigoe, Akitaka
AU - Yamada, Yoichi
AU - Taga, Ryo
AU - Ogawa, Shuichi
AU - Takakuwa, Yuji
N1 - Publisher Copyright:
© 2016 The Japan Society of Applied Physics.
PY - 2016/10
Y1 - 2016/10
N2 - Synchrotron radiation photoelectron spectroscopy during the oxidation of a Si(100)2 ' 1 surface at room temperature revealed the existence of molecularly adsorbed oxygen, which was considered to be absent. The O 1s spectrum of such oxidation was found to be similar to that of Si(111)7 ' 7 surface oxidation. Also, molecular oxygen appeared after the initial surface oxides were formed, indicating that it was not a precursor for dissociation oxygen adsorption on a clean surface. Considering this finding, we have proposed presumable structural models for atomic configurations, where molecular oxygen resided on the oxidized silicon with two oxygen atoms at the backbonds.
AB - Synchrotron radiation photoelectron spectroscopy during the oxidation of a Si(100)2 ' 1 surface at room temperature revealed the existence of molecularly adsorbed oxygen, which was considered to be absent. The O 1s spectrum of such oxidation was found to be similar to that of Si(111)7 ' 7 surface oxidation. Also, molecular oxygen appeared after the initial surface oxides were formed, indicating that it was not a precursor for dissociation oxygen adsorption on a clean surface. Considering this finding, we have proposed presumable structural models for atomic configurations, where molecular oxygen resided on the oxidized silicon with two oxygen atoms at the backbonds.
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U2 - 10.7567/JJAP.55.100307
DO - 10.7567/JJAP.55.100307
M3 - Article
AN - SCOPUS:84989291142
VL - 55
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 10
M1 - 100307
ER -