Detection of metastable Cl+ ions in time-modulated ICP by time resolved LIF

S. Kumagai, M. Sasaki, Mitsumasa Koyanagi, K. Hane

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Pulse time-modulated plasma etching is used to achieve high anisotropy, high etch rate, high selectivity and low charging damage by making use of the reactive plasma species composition changes. The authors have measured, for the first time, the metastable chlorine ions Cl/sup +∗/ in time-modulated inductively coupled plasma by time resolved laser induced fluorescence spectroscopy.

Original languageEnglish
Title of host publication1999 International Microprocesses and Nanotechnology Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages150-151
Number of pages2
ISBN (Electronic)4930813972, 9784930813978
DOIs
Publication statusPublished - 1999
Event1999 International Microprocesses and Nanotechnology Conference - Yokohama, Japan
Duration: 1999 Jul 61999 Jul 8

Publication series

Name1999 International Microprocesses and Nanotechnology Conference

Other

Other1999 International Microprocesses and Nanotechnology Conference
CountryJapan
CityYokohama
Period99/7/699/7/8

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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