Design of radial line slot antennas at 8.3 GHz for large area uniform plasma generation

Tetsuya Yamamoto; Nguyen Thang Chien; Makoto Ando; Naohisa Goto; Masaki Hirayama; Tadahiro Ohmi

doi:10.1143/jjap.38.2082

Design of radial line slot antennas at 8.3 GHz for large area uniform plasma generation

Tetsuya Yamamoto, Nguyen Thang Chien, Makoto Ando, Naohisa Goto, Masaki Hirayama, Tadahiro Ohmi

Research output: Contribution to journal › Article › peer-review

41 Citations (Scopus)

Abstract

A radial line slot antenna (RLSA) 400 mm in diameter is designed for a plasma source at 8.3 GHz as a candidate for a large area high density plasma source with a narrow process space. A RLSA with paired slots arrayed concentrically on its aperture is designed and applied to a plasma process system which does not need a magnetic field. First, electrical performance without plasma is predicted and measured. Reasonable voltage standing wave ratio (VSWR) as well as uniform field distribution on the antenna aperture is realized. As applied to the plasma test equipment, high electron density of more than 1 × 10¹² cm^-3 as well as fairly uniform (±2%) distribution at a low electron temperature is produced in the vicinity of the antenna aperture through a quartz glass window. Control of uniformity in ion flux profiles by blocking the antenna aperture is demonstrated.

Original language	English
Pages (from-to)	2082-2088
Number of pages	7
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	38
Issue number	4 A
DOIs	https://doi.org/10.1143/jjap.38.2082
Publication status	Published - 1999
Externally published	Yes

Keywords

Ion flux
Planar waveguide
Plasma density
Plasma process
Radial line slot antenna

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/jjap.38.2082

Cite this

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title = "Design of radial line slot antennas at 8.3 GHz for large area uniform plasma generation",

abstract = "A radial line slot antenna (RLSA) 400 mm in diameter is designed for a plasma source at 8.3 GHz as a candidate for a large area high density plasma source with a narrow process space. A RLSA with paired slots arrayed concentrically on its aperture is designed and applied to a plasma process system which does not need a magnetic field. First, electrical performance without plasma is predicted and measured. Reasonable voltage standing wave ratio (VSWR) as well as uniform field distribution on the antenna aperture is realized. As applied to the plasma test equipment, high electron density of more than 1 × 1012 cm-3 as well as fairly uniform (±2%) distribution at a low electron temperature is produced in the vicinity of the antenna aperture through a quartz glass window. Control of uniformity in ion flux profiles by blocking the antenna aperture is demonstrated.",

keywords = "Ion flux, Planar waveguide, Plasma density, Plasma process, Radial line slot antenna",

author = "Tetsuya Yamamoto and Chien, {Nguyen Thang} and Makoto Ando and Naohisa Goto and Masaki Hirayama and Tadahiro Ohmi",

year = "1999",

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T1 - Design of radial line slot antennas at 8.3 GHz for large area uniform plasma generation

AU - Yamamoto, Tetsuya

AU - Chien, Nguyen Thang

AU - Ando, Makoto

AU - Goto, Naohisa

AU - Hirayama, Masaki

AU - Ohmi, Tadahiro

PY - 1999

Y1 - 1999

N2 - A radial line slot antenna (RLSA) 400 mm in diameter is designed for a plasma source at 8.3 GHz as a candidate for a large area high density plasma source with a narrow process space. A RLSA with paired slots arrayed concentrically on its aperture is designed and applied to a plasma process system which does not need a magnetic field. First, electrical performance without plasma is predicted and measured. Reasonable voltage standing wave ratio (VSWR) as well as uniform field distribution on the antenna aperture is realized. As applied to the plasma test equipment, high electron density of more than 1 × 1012 cm-3 as well as fairly uniform (±2%) distribution at a low electron temperature is produced in the vicinity of the antenna aperture through a quartz glass window. Control of uniformity in ion flux profiles by blocking the antenna aperture is demonstrated.

AB - A radial line slot antenna (RLSA) 400 mm in diameter is designed for a plasma source at 8.3 GHz as a candidate for a large area high density plasma source with a narrow process space. A RLSA with paired slots arrayed concentrically on its aperture is designed and applied to a plasma process system which does not need a magnetic field. First, electrical performance without plasma is predicted and measured. Reasonable voltage standing wave ratio (VSWR) as well as uniform field distribution on the antenna aperture is realized. As applied to the plasma test equipment, high electron density of more than 1 × 1012 cm-3 as well as fairly uniform (±2%) distribution at a low electron temperature is produced in the vicinity of the antenna aperture through a quartz glass window. Control of uniformity in ion flux profiles by blocking the antenna aperture is demonstrated.

KW - Ion flux

KW - Planar waveguide

KW - Plasma density

KW - Plasma process

KW - Radial line slot antenna

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Design of radial line slot antennas at 8.3 GHz for large area uniform plasma generation

Abstract

Keywords

ASJC Scopus subject areas

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