An Si/SiO2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190nm in the near infrared region (1300-1500 nm) is experimentally demonstrated.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering