Design and fabrication of multi-channel Si/SiO2 autocloned photonic crystal edge filters

Yasuo Ohtera, Hirohito Yamada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Si/SiO2 alternating layers having zigzag layer interfaces are fabricated on a silica substrate with surface gratings using the autocloning method. The multilayer was designed to function as long-wave pass type edge filters with various cut-off wavelengths. The shift of the cut-off wavelength of the order of 190nm in NIR (near infrared) was experimentally demonstrated.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2010
PublisherOptical Society of America (OSA)
ISBN (Print)9781557528919
DOIs
Publication statusPublished - 2010
EventOptical Interference Coatings, OIC 2010 - Tucson, AZ, United States
Duration: 2010 Jun 62010 Jun 11

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherOptical Interference Coatings, OIC 2010
CountryUnited States
CityTucson, AZ
Period10/6/610/6/11

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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    Ohtera, Y., & Yamada, H. (2010). Design and fabrication of multi-channel Si/SiO2 autocloned photonic crystal edge filters. In Optical Interference Coatings, OIC 2010 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/oic.2010.pdwd14