Abstract
Si/SiO2 alternating layers having zigzag layer interfaces are fabricated on a silica substrate with surface gratings using the autocloning method. The multilayer was designed to function as long-wave pass type edge filters with various cut-off wavelengths. The shift of the cut-off wavelength of the order of 190nm in NIR (near infrared) was experimentally demonstrated.
| Original language | English |
|---|---|
| Title of host publication | Optical Interference Coatings, OIC 2010 |
| Publisher | Optical Society of America (OSA) |
| ISBN (Print) | 9781557528919 |
| DOIs | |
| Publication status | Published - 2010 |
| Event | Optical Interference Coatings, OIC 2010 - Tucson, AZ, United States Duration: 2010 Jun 6 → 2010 Jun 11 |
Publication series
| Name | Optics InfoBase Conference Papers |
|---|---|
| ISSN (Electronic) | 2162-2701 |
Other
| Other | Optical Interference Coatings, OIC 2010 |
|---|---|
| Country | United States |
| City | Tucson, AZ |
| Period | 10/6/6 → 10/6/11 |
ASJC Scopus subject areas
- Instrumentation
- Atomic and Molecular Physics, and Optics
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Cite this
Ohtera, Y., & Yamada, H. (2010). Design and fabrication of multi-channel Si/SiO2 autocloned photonic crystal edge filters. In Optical Interference Coatings, OIC 2010 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/oic.2010.pdwd14