Design and fabrication of multi-channel Si/SiO2 autocloned photonic crystal edge filters

Yasuo Ohtera, Hirohito Yamada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Si/SiO2 alternating layers having zigzag layer interfaces are fabricated on a silica substrate with surface gratings using the autocloning method. The multilayer was designed to function as long-wave pass type edge filters with various cut-off wavelengths. The shift of the cut-off wavelength of the order of 190nm in NIR (near infrared) was experimentally demonstrated.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2010
Publication statusPublished - 2010 Dec 1
EventOptical Interference Coatings, OIC 2010 - Tucson, AZ, United States
Duration: 2010 Jun 62010 Jun 11

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherOptical Interference Coatings, OIC 2010
CountryUnited States
CityTucson, AZ
Period10/6/610/6/11

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Design and fabrication of multi-channel Si/SiO<sub>2</sub> autocloned photonic crystal edge filters'. Together they form a unique fingerprint.

  • Cite this

    Ohtera, Y., & Yamada, H. (2010). Design and fabrication of multi-channel Si/SiO2 autocloned photonic crystal edge filters. In Optical Interference Coatings, OIC 2010 (Optics InfoBase Conference Papers).