Depth profiling of thin surface layers using the amplitude modulation method in radiofrequency-powered glow discharge optical emission spectrometry

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10 Citations (Scopus)

Abstract

A novel technique for accurate in-depth analysis of thin layers is described. Radiofrequency voltages applied to a Grimm-style glow discharge lamp are modulated at a very low frequency, which leads to a reduction in the sputtering rate and variation of the emission signals at the specific modulation frequency. With amplitude modulation associated with phase-sensitive detection, the resultant emission intensities can be measured with better signal-to-noise ratios, although the sputtering rate and the sampling amount are reduced by a factor of ∼10. It is possible to obtain the depth profile of a 13 nm thick Ni-electroplated layer, whereas profiling is difficult for conventional detection.

Original languageEnglish
Pages (from-to)63-69
Number of pages7
JournalSurface and Interface Analysis
Volume27
Issue number1
Publication statusPublished - 1999 Jan 1

Keywords

  • Amplitude modulation method
  • Depth profiling
  • GDOES
  • r.f. glow discharge

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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