Depth profiling by ion-beam analysis

K. Ishii; S. Morita

doi:10.1007/BF03156058

Depth profiling by ion-beam analysis

K. Ishii, S. Morita

ENG - Quantum Science and Energy Engineering

Research output: Contribution to journal › Article › peer-review

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Abstract

In an ion-beam analysis, a sample is bombarded with charged-particle beams and characteristic X-rays (PIXE), nuclear γ-rays (PIGE) or charged particles produced in the target material are measured. A method for deducing a concentration depth profile of an element in the sample from a yield curve of these reaction products as a function of the projectile energy is derived on the basis of the least-squares method. Validity of this method is demonstrated taking an example of PIXE.

Original language	English
Pages (from-to)	151-157
Number of pages	7
Journal	Acta Physica Hungarica
Volume	65
Issue number	2-3
DOIs	https://doi.org/10.1007/BF03156058
Publication status	Published - 1989 Jun 1

ASJC Scopus subject areas

Physics and Astronomy(all)

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AB - In an ion-beam analysis, a sample is bombarded with charged-particle beams and characteristic X-rays (PIXE), nuclear γ-rays (PIGE) or charged particles produced in the target material are measured. A method for deducing a concentration depth profile of an element in the sample from a yield curve of these reaction products as a function of the projectile energy is derived on the basis of the least-squares method. Validity of this method is demonstrated taking an example of PIXE.

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Depth profiling by ion-beam analysis

Abstract

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