Depth profile of nitrogen atoms in silicon oxynitride films formed by low-electron-temperature microwave plasma nitridation

Shigemi Murakawa, Shu Ichi Ishizuka, Toshio Nakanishi, Tomoyuki Suwa, Akinobu Teramoto, Shigetoshi Sugawa, Takeo Hattori, Tadahiro Ohmi

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2 Citations (Scopus)

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Engineering & Materials Science

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