Deposition Thickness Sensor for Ion Sputtering Apparatus

Hironori Kumazaki, Seiki lnaba, Kazuhiro Hane

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

A quartz core microcantilever fabricated from an optical fiber tip can be utilized for monitoring of deposition thickness. Dynamic monitoring of deposition thickness was performed without influence of electrical noise in an ion sputtering apparatus. Resonance frequencies were measured as a function of deposition time of Au and Ag Resonance frequency decreased from 11.52kHz to 10.89kHz during a deposition time of 60 minutes which corresponded to a thickness of 360 nm in case of Au.

Original languageEnglish
Pages (from-to)105-108
Number of pages4
JournalIEEJ Transactions on Sensors and Micromachines
Volume117
Issue number2
DOIs
Publication statusPublished - 1997

Keywords

  • in situ film thickness measurement
  • ion sputtering apparatus
  • optical sensor
  • quartz core microcantilever

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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