Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Kazuhiko Endo, Toru Tatsumi, Yoshihisa Matsubara

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Fingerprint Dive into the research topics of 'Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics'. Together they form a unique fingerprint.

Physics & Astronomy