Deposition of multilayered titanium thin film by Nd:YAG laser ablation

T. Nakamura, H. Takahashi, K. Yamamoto, N. Sato, A. Muramatsu, E. Matsubara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

TiO2 and Ti/TiO2 thin films were deposited on a quartz substrate by laser ablation of TiO2 and Ti targets using Nd:YAG pulsed laser. After sulfurization of the TiO2 film in H2S or CS2 gas at 1273 K for 1 hour, the surface atomic structure was changed. Furthermore, the Ti/TiO2 film was successfully prepared by the subsequent ablation of Ti and TiO2 targets. The morphology and structure of the films were characterized by XRD, XPS and AFM analyses.

Original languageEnglish
Title of host publicationYazawa International Symposium
Subtitle of host publicationMetallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies
EditorsF. Kongoli, K. Itagaki, C. Yamauchi, H.Y. Sohn, F. Kongoli, K. Itagaki, C. Yamauchi, H.Y. Sohn
Pages1241-1246
Number of pages6
Publication statusPublished - 2003 Oct 16
EventYazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies - San Diego, CA, United States
Duration: 2003 Mar 22003 Mar 6

Publication series

NameYazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies
Volume1

Other

OtherYazawa International Symposium: Metallurgical and Materials Processing: Principles and Technologies; Materials Processing Fundamentals and New Technologies
CountryUnited States
CitySan Diego, CA
Period03/3/203/3/6

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint Dive into the research topics of 'Deposition of multilayered titanium thin film by Nd:YAG laser ablation'. Together they form a unique fingerprint.

  • Cite this

    Nakamura, T., Takahashi, H., Yamamoto, K., Sato, N., Muramatsu, A., & Matsubara, E. (2003). Deposition of multilayered titanium thin film by Nd:YAG laser ablation. In F. Kongoli, K. Itagaki, C. Yamauchi, H. Y. Sohn, F. Kongoli, K. Itagaki, C. Yamauchi, & H. Y. Sohn (Eds.), Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies (pp. 1241-1246). (Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies; Vol. 1).