Deposition of α-Al₂O₃films on Ti(C, N)-based cermet substrate by laser chemical vapor deposition using a diode laser

α-Al₂O₃film was first deposited on Ti(C, N)-based cermet substrate by laser chemical vapor deposition (LCVD) in a CO ₂H₂ atmosphere. The effects of atmosphere, laser power (P_L), total pressure (P_tot) and deposition temperature (T_dep) on the crystal phase and microstructure were investigated.α- and γ-phase mixture film was prepared at T _dep = 833 K. Single phaseα-Al₂O₃film was obtained at T_dep = 903 K. The surface morphology ofα-Al ₂O₃film changed from a cauliflower-like to a granular-like structure with increasing T_dep and decreasing P_tot. α-Al₂O₃film with a well-developed facet structure was obtained at P_tot = 0.6 kPa and T_dep = 933 K.