Deposition of α-Al2O3films on Ti(C, N)-based cermet substrate by laser chemical vapor deposition using a diode laser

Yu You, Akihiko Ito, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

α-Al2O3film was first deposited on Ti(C, N)-based cermet substrate by laser chemical vapor deposition (LCVD) in a CO 2H2 atmosphere. The effects of atmosphere, laser power (PL), total pressure (Ptot) and deposition temperature (Tdep) on the crystal phase and microstructure were investigated.α- and γ-phase mixture film was prepared at T dep = 833 K. Single phaseα-Al2O3film was obtained at Tdep = 903 K. The surface morphology ofα-Al 2O3film changed from a cauliflower-like to a granular-like structure with increasing Tdep and decreasing Ptot. α-Al2O3film with a well-developed facet structure was obtained at Ptot = 0.6 kPa and Tdep = 933 K.

Original languageEnglish
Pages (from-to)570-572
Number of pages3
JournalJournal of the Ceramic Society of Japan
Volume119
Issue number1391
DOIs
Publication statusPublished - 2011 Jul

Keywords

  • Laser chemical vapor deposition
  • Oxidization
  • Ti(C, N)-based cermet

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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