Deposition and Piezoelectric Characteristics of ZnO Films by Using an ECR Sputtering System

Michio Kadota, Toru Kasanami, Makoto Minakata

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Piezoelectric properties of ZnO films, were investigated by using an Electron Cyclotron Resonance (ECR) sputtering system. It was confirmed that this system was capable of depositing a ZnO film with a large specific resistance, and good c-axis orientation on an interdigital transducer (IDT)/glass substrate at a low temperature (less than 200°C) and in a low gas pressure (~10-4 torr). Furthermore these ZnO films exhibited excellent SAW characteristics (insertion losses) and effective electromechanical coupling factors (keff) compared with ZnO films deposited by a conventional RF magnetron sputtering system. Further, this ECR sputtering system was capable of depositing a ZnO film, without heating the substrate, that was capable of propagating a Rayleigh SAW at 700 MHz for the first time.

Original languageEnglish
Pages (from-to)479-483
Number of pages5
JournalIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
Volume41
Issue number4
DOIs
Publication statusPublished - 1994 Jul
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation
  • Acoustics and Ultrasonics
  • Electrical and Electronic Engineering

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