Depletion- and enhancement-mode modulation-doped field-effect transistors for ultrahigh-speed applications: An electrochemical fabrication technology

Dong Xu, Tetsuya Suemitsu, Jiro Osaka, Yohtaro Umeda, Yasuro Yamane, Yasunobu Ishii, Tetsuyoshi Ishii, Toshiaki Tamamura

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

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Engineering & Materials Science